Optics & Continuous Micro-Patterning
Roll-to-Roll UV Nanoimprint (UV-NIL) Calculator
Model continuous roll-to-roll UV nanoimprint lithography (R2R UV-NIL) for micro-lens arrays, moth-eye anti-reflective textures, and prismatic optical films. Calculate cavity filling time ($t_{\text{fill}}$), line speed, and UV exposure dose.
Process & CAM Parameters
UV-curable acrylate / epoxy resin viscosity in centipoise (mPa·s).
Depth of micro-prism or lens cavity in microns (µm).
Feature lateral radius / half-width in microns (µm).
Pneumatic nip cylinder pressure in bar.
Peak 395nm UV LED irradiance in mW/cm².
Engineering Calculations
Cavity Fill Time (t_fill)
4.2ms
Max Web Line Speed
18.5m/min
Delivered UV Dose
340mJ/cm²
Demolding Status
Clean Peel (No Adhesion)
Dynamic CAM Toolpath & Vector Preview
Need complete manufacturing prepress guidance and formulas?
Read the Full UV Nanoimprint Guide →Engineering Principles & Formulations
Roll-to-Roll UV Nanoimprint Lithography (R2R UV-NIL) utilizes a flexible nickel sleeve or quartz cylinder engraved with nanoscale/microscale optical patterns to imprint liquid photopolymer coated on a continuous PET/TAC web, followed by through-web UV crosslinking.
Governing physics equations:
- Capillary & Hydrodynamic Cavity Filling: $$t_{\text{fill}} = \frac{2 \mu L^2}{\gamma \cos\theta \cdot H + P_{\text{nip}} H^2}$$ High line speeds require low resin viscosity ($< 50\text{ mPa}\cdot\text{s}$) and degassing.
- Required UV Curing Dose: $$D = I_{\text{UV}} \cdot \frac{W_{\text{UV}}}{v_{\text{web}}} \ge D_{\text{cure}} \quad [250 - 450\text{ mJ/cm}^2]$$
- Residual Layer Thickness (RLT): Controlled to $< 1.0\,\mu\text{m}$ to minimize optical haze and birefringence.