OPTICAL METROLOGY & PHOTOLITHOGRAPHY

Multi-Beam Interference Lithography Grating Calculator

Calculate holographic diffraction grating pitch ($\Lambda$), 2D photonic crystal lattice constants ($a$), sinusoidal aerial fringe contrast ($\gamma$), and photoresist exposure dose for multi-beam interference lithography (MBIL).

1. Optical Interference Parameters

Laser Exposure Wavelength (λ in nm)

Beam Configuration & Pattern Geometry

Half Interference Angle (θ in degrees)

Half-angle between symmetrical interfering coherent beams.

Immersion Medium Refractive Index ($n$)

1.00 for Air, 1.44 for Water Immersion, 1.52 for Quartz Prism.

Beam Intensity ($I_0$ in mW/cm²)

Total incident optical power density.

Resist Threshold Dose ($D_{\text{crit}}$ in mJ/cm²)

Target photoresist clearance dose.

2. Grating Pitch & Exposure Output

Grating / Lattice Pitch (Λ)

378nm

Spatial Frequency (Lines/mm)

2,645l/mm

Fringe Contrast (γ)

0.98

Exposure Time (t_exp)

4.80s

Feature Line Width (CD)

189nm

1st Order Littrow Angle (@633nm)

56.8°

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